Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS) [6898-23]
نویسندگان
چکیده
In this paper we report a novel fabrication technique for silicon photonic waveguides with sub-micron dimensions. The technique is based upon the Local Oxidation of Silicon (LOCOS) process widely utilised in the fabrication of microelectronics components. This approach enables waveguides to be fabricated with oxide sidewalls with minimal roughness at the silicon/SiO2 interface. It is also sufficiently flexible to enable the depth of the oxidised sidewall to be varied to control the polarisation performance of the waveguides.
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